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ME 290R Lecture 3.3: Nanoimprint Lithography - Process Mechanics III
Online Presentations | 02 Apr 2019 | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 3.4: Nanoimprint Lithography - Process Mechanics IV
Online Presentations | 02 Apr 2019 | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 1: Introduction
Online Presentations | 27 Mar 2019 | Contributor(s):: Taylor, Hayden
An overview of current and emerging lithography technologies and challenges. Future lithography requirements (with reference to the International Technology Roadmap for Semiconductors). Requirements for integration of lithography with other process steps.
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ME 290R Lecture 2.1: Lithography Performance Criteria - Technical
Online Presentations | 27 Mar 2019 | Contributor(s):: Taylor, Hayden
Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.
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ME 290R Lecture 2.2: Lithography Performance Criteria - Technical (Yield Modeling)
Online Presentations | 27 Mar 2019 | Contributor(s):: Taylor, Hayden
Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.
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Tutorial on Two Photon Lithography Tool
Online Presentations | 26 Nov 2018 | Contributor(s):: Mohammad Mahfuzul Kabir, Varun Ajit Kelkar
Two-photon lithography (TPL) is a nano-scale 3-d fabrication technique. TPL depends upon the two-photon polymerization process, whereby two incident photons of light are absorbed by a precursor material leading to polymerization. The smallest feature size (voxel) achievable in a TPL...
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Focused Ion Beam (FIB): “Seeing” and “Processing” at the Nano-Scale
Online Presentations | 01 Oct 2018 | Contributor(s):: Wook Jun Nam, NACK Network
OutlineFIB OverviewFIB OperationFIB Applications
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ECE 695Q Lecture 42: Advanced Lithography II
Online Presentations | 02 Dec 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 45: Dry Etching I
Online Presentations | 02 Dec 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 44: Etching
Online Presentations | 02 Dec 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 46: Dry Etching II
Online Presentations | 01 Dec 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 47: Dry Etching III
Online Presentations | 01 Dec 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 48: Planarization I
Online Presentations | 01 Dec 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 49: Planarization II
Online Presentations | 01 Dec 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 43: Advanced Lithography III
Online Presentations | 01 Nov 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 41: Advanced Lithography I
Online Presentations | 12 Oct 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 38: Nanoimprint Lithography (NIL) – NIL Mold Fabrication
Online Presentations | 12 Oct 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 37: Nanoimprint Lithography (NIL) - Resist for UV-NIL
Online Presentations | 12 Oct 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 29: Focused Electron Beam Induced Deposition and Deposition Rate
Online Presentations | 10 Oct 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 36: Nanoimprint Lithography (NIL) – Alignment in NIL
Online Presentations | 28 Sep 2016 | Contributor(s):: Minghao Qi