ME 290R Lecture 1: Introduction

By Taylor, Hayden

Mechanical Engineering, University of California at Berkeley, Berkeley, CA

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Abstract

An overview of current and emerging lithography technologies and challenges. Future lithography requirements (with reference to the International Technology Roadmap for Semiconductors). Requirements for integration of lithography with other process steps.

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Researchers should cite this work as follows:

  • Taylor, Hayden (2019), "ME 290R Lecture 1: Introduction," https://nanohub.org/resources/30195.

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Tags

  1. lithography
  2. nano imprinting
  3. nanoMFG Node
  4. processing