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ME 290R Lecture 4.2: Nanoimprint Lithography – Imprintable Materials II
Online Presentations | 15 Apr 2019 | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 5: Nanoimprint Lithography – Stamp Fabrication
Online Presentations | 15 Apr 2019 | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 6.1: Nanoimprint Lithography - Machine Design I
Online Presentations | 15 Apr 2019 | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 6.2: Nanoimprint Lithography – Machine Design II
Online Presentations | 15 Apr 2019 | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 4.1: Nanoimprint Lithography – Imprintable Materials I
Online Presentations | 05 Apr 2019 | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 3.1: Nanoimprint Lithography - Process Mechanics I
Online Presentations | 02 Apr 2019 | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 3.2: Nanoimprint Lithography - Process Mechanics II
Online Presentations | 02 Apr 2019 | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 3.3: Nanoimprint Lithography - Process Mechanics III
Online Presentations | 02 Apr 2019 | Contributor(s):: Taylor, Hayden
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ME 290R Lecture 3.4: Nanoimprint Lithography - Process Mechanics IV
Online Presentations | 02 Apr 2019 | Contributor(s):: Taylor, Hayden
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ME 290R: Topics in Manufacturing - Nanoscale Manipulation of Materials
Courses | 27 Mar 2019 | Contributor(s):: Taylor, Hayden
This graduate level course surveys sub-micrometer pattern-transfer techniques with applications in semiconductor manufacturing, data storage, photonics, and surface engineering.
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ME 290R Lecture 1: Introduction
Online Presentations | 27 Mar 2019 | Contributor(s):: Taylor, Hayden
An overview of current and emerging lithography technologies and challenges. Future lithography requirements (with reference to the International Technology Roadmap for Semiconductors). Requirements for integration of lithography with other process steps.
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ME 290R Lecture 2.1: Lithography Performance Criteria - Technical
Online Presentations | 27 Mar 2019 | Contributor(s):: Taylor, Hayden
Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.
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May 06 2010
Illinois CNST ANNUAL NANOTECHNOLOGY WORKSHOP 2010
The broad objective of the Center for Nanoscale Science and Technology (CNST) workshop is to showcase University of Illinois research in bionanotechnology/ nanomedicine,...
https://nanohub.org/events/details/268
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Illinois ME 498 Introduction of Nano Science and Technology, Lecture 28: Nanomanufacturing 3: Imprint Technology
Online Presentations | 28 Jan 2010 | Contributor(s):: Nick Fang
Nanomanufacturing 3: Imprint TechnologyTopics: Imprinting: A Long History Nanoimprinting and Hot Embossing Example of nanoimprint machine Volume Manufacture Large-Scale NIL Examples Step and Flash imprint Lithography(SFIL) Application Example: Security NIL application in metamaterials Imprinting...