ME 290R Lecture 2.2: Lithography Performance Criteria - Technical (Yield Modeling)

By Taylor, Hayden

Mechanical Engineering, University of California at Berkeley, Berkeley, CA

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Abstract

Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.

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Researchers should cite this work as follows:

  • Taylor, Hayden (2019), "ME 290R Lecture 2.2: Lithography Performance Criteria - Technical (Yield Modeling)," https://nanohub.org/resources/30205.

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Tags

  1. defects
  2. lithography
  3. microscopy
  4. nanoMFG Node
  5. processing
  6. scanning electron microscopy (SEM)
  7. yield modeling