Tags: photo resist

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  1. EKC and Piranha remove titanium and niobium? And TiO2:Nb (niobium doped titanium dioxide)?

    Q&A|Closed | Responses: 1

    I would like to know if EKC (aqueous organic proprietary blend of 2-(2-Aminoethyoxy) Ethanol, Hydroxylamine and Cathechol) or Piranha ( sulfuric peroxide...

    https://nanohub.org/answers/question/2561

  2. ECE 595M Lecture 3.3: Lithography - Resist Technology

    Online Presentations | 25 Feb 2020 | Contributor(s):: Minghao Qi

  3. Learning Module: Photolithography Overview for MEMS

    Teaching Materials | 26 Apr 2017 | Contributor(s):: Southwest Center for Microsystems Education (SCME)

    This learning module provides an overview of the most common photolithography process used for the fabrication of microelectromechanical systems (MEMS), its terminology and basic concepts.  Activities allow you to further explore some of these concepts.

  4. Learning Module: Photolithography Overview for MEMS - Instructor Guides

    Teaching Materials | 26 Apr 2017 | Contributor(s):: Southwest Center for Microsystems Education (SCME)

    This learning modules provides an overview of the most common photolithography process used in the fabrication of microelectromechnical systems (MEMS), its terminology and basic concepts.  Activities allows students to further explore some of these concepts.