ME 290R Lecture 12.1: Scanning-beam Lithography and Directed Self-assembly I

By Taylor, Hayden

Mechanical Engineering, University of California at Berkeley, Berkeley, CA

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  • Taylor, Hayden (2019), "ME 290R Lecture 12.1: Scanning-beam Lithography and Directed Self-assembly I," https://nanohub.org/resources/30498.

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  1. lithography
  2. nanomanufacturing
  3. nanoMFG Node
  4. processing
  5. scanning-beam lithography
  6. self-assembly
ME 290R Lecture 12.1: Scanning-beam Lithography and Directed Self-assembly I
  • Lecture 12.1: Scanning-­‐beam Lithography and Directed Self-­‐assembly  I 1. Lecture 12.1: Scanning-­‐be… 0
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  • Optical lithography is facing resolution and cost limitations 2. Optical lithography is facing … 36.469803136469807
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  • Agenda: scanning-beam lithography and directed self-assembly 3. Agenda: scanning-beam lithogra… 197.39739739739741
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  • E-beam lithography: beam formation and steering 4. E-beam lithography: beam forma… 243.97731064397732
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  • Electron beam focusing 5. Electron beam focusing 721.7884551217885
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  • What limits the diameter of an electron beam or 6. What limits the diameter of an… 856.89022355689031
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  • If there is no resist, what is the resolution? 7. If there is no resist, what is… 950.25025025025025
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  • Electron-beam induced deposition (EBID) 8. Electron-beam induced depositi… 1120.9542876209544
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  • Electron scattering in resist 9. Electron scattering in resist 1189.0557223890558
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  • Monte Carlo- simulated trajectories of 100 electrons 10. Monte Carlo- simulated traject… 1739.3727060393728
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  • Electron energy affects point spread function 11. Electron energy affects point … 2197.6309642976312
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  • State of the art in e-beam resist 12. State of the art in e-beam res… 2265.965965965966
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  • Recap: contrast in resist materials 13. Recap: contrast in resist mate… 2561.2278945612279
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  • Shot noise effects 14. Shot noise effects 2645.6122789456122
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  • Summary: e-beam resolution • Contributors to minimum e-beam-written feature size are: – Beam diameter – Electron scattering in resist (forward and back) – Diffusion of generated acids in resist – Shot noise 15. Summary: e-beam resolution •… 3055.5555555555557
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  • Proton and ion beams • Protons are 1800 times more massive than electrons • Protons with energies ~MeV are directed at the resist (cf electrons: ~10 keV) • Much less scattering than electrons: high aspect-ratio features possible • Multilayers by controlling beam energy • Helium ions extend this principle even further http://www.pbeamwriting.com/: Frank Watt, National University of Singapore 16. Proton and ion beams • Proto… 3064.764764764765
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