ME 290R Lecture 6.1: Nanoimprint Lithography - Machine Design I
ME 290R Lecture 6.1: Nanoimprint Lithography - Machine Design I
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1. Lecture 6.1: Nanoimprint Lith…
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2. Machine design considerations
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3. Alignment, registration and ov…
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4. Moire-based alignment
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5. Early Moire work - 2006
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6. Scatterometry for precise alig…
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7. Local heating of stamp to corr…
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8. Local heating of stamp to corr…
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9. Local heating of stamp to corr…
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10. Load application options
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11. Shear thinning
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12. Oscillatory load application
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13. Oscillatory load application
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14. Ultrasonic loading of stamp
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15. Shear-assisted imprint
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16. Addressing gas bubble entrapme…
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17. Air bubble formation/dissoluti…
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18. Air bubble formation/dissoluti…
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19. State of the art today
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20. Relative importance of gas dis…
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