ME 290R Lecture 3.1: Nanoimprint Lithography - Process Mechanics I

By Taylor, Hayden

Mechanical Engineering, University of California at Berkeley, Berkeley, CA

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Researchers should cite this work as follows:

  • Taylor, Hayden (2019), "ME 290R Lecture 3.1: Nanoimprint Lithography - Process Mechanics I," https://nanohub.org/resources/30264.

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ME 290R Lecture 3.1: Nanoimprint Lithography - Process Mechanics I
  • Lecture 3.1: Nanoimprint Lithography – Process Mechanics I 1. Lecture 3.1: Nanoimprint Lith… 0
    00:00/00:00
  • Nanoimprint offers exceptional spatial resolution 2. Nanoimprint offers exceptional… 13.380046713380047
    00:00/00:00
  • NIL has many variants and implementations 3. NIL has many variants and impl… 320.78745412078746
    00:00/00:00
  • Outline - Forms of NIL 4. Outline - Forms of NIL 603.37003670337
    00:00/00:00
  • Scales of resist (resin) flow 5. Scales of resist (resin) flow 2142.7427427427428
    00:00/00:00
  • Resist dispensing approaches 6. Resist dispensing approaches 2736.4364364364365
    00:00/00:00