CVD has become a significant process particularly for its use in electronics.  We use cold atmospheric plasma to deposit silica in a much more scalable manner.  Silica is deposited using CVD for applications in many microelectronic devices, but our process has the potential to greatly reduce the production cost of silica films.

I am a senior in Materials Science Engineering, and I have been doing research with Professor Rahimi for a year.  I have been working with Venkat during the fall semester of 2023 on CAP CVD.

Professor Rahim Rahimi, Venkat Kasi

SCALE

Researchers should cite this work as follows:

• Samuel Josiah Hyde, Rahim Rahimi, Venkat Kasi (2023), "Cold Atmospheric Plasma Chemical Vapor Deposition of Silica," https://nanohub.org/resources/38318.

  BibTex | EndNote

1. chemical vapor deposition (CVD)
2. cold plasma
3. SCALE@Purdue
4. SCALE (Scalable Asymmetric Lifecycle Engagement)
5. undergraduate research