Progress in Vacuum Pressure Measurement

By Martin Wuest

Head of Sensor Technology, Inficon, Balzers, Liechtenstein

Published on

Abstract

For many years standard vacuum pressure measurement sensors consist of capacitance diaphragm gauges, Pirani heat transfer gauges as well as ionization gauges. Development has progressed from passive gauges with a detached controller to combination gauges with integrated electronics. Market demand from industry continues to force the development of smaller, cheaper and better process sensors. Better in this context means the sensors must survive the harsh industrial process conditions for longer, measure faster and with better reproducibility. In the area of vacuum pressure metrology new developments are occurring in national measurement institutes and universities. The pressure is determined by measuring the refractive index. I will present some of the recent developments.

Bio

Martin Wüest Martin Wüest is Senior Scientist Sensor Technology in the Vacuum Control business unit of INFICON Ltd. in Balzers, Principality of Liechtenstein. In his function he is involved in research and development of new total pressure sensors ranging from ionization and heat transfer gauges to membrane deflection gauges. Martin graduated in physics from the University of Bern, Switzerland, in 1987 and received his Ph.D. in physics also from the University of Bern in 1991 with a thesis on ion scattering on rough surfaces. Before joining INFICON in 2003 he was senior scientist in the Space Science and Engineering Division of Southwest Research Institute, San Antonio, TX. There he was involved in the design and calibration of mass spectrometers and energetic neutral atom imagers for NASA’s Cassini and IMAGE mission.

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Researchers should cite this work as follows:

  • Martin Wuest (2018), "Progress in Vacuum Pressure Measurement," https://nanohub.org/resources/29143.

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Time

Location

Room 2001, Birck Nanotechnology Center, Purdue University, West Lafayette, IN

Progress in Vacuum Pressure Measurement
  • Progress in Vacuum Pressure Measurement 1. Progress in Vacuum Pressure Me… 0
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  • Overview 2. Overview 12.145478812145479
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  • What is Vacuum? 3. What is Vacuum? 48.081414748081414
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  • Early History 4. Early History 128.42842842842845
    00:00/00:00
  • The Quest for the Ultimate Vacuum 5. The Quest for the Ultimate Vac… 251.65165165165166
    00:00/00:00
  • Changing Markets 6. Changing Markets 408.04137470804142
    00:00/00:00
  • The Quest for Reproducibility 7. The Quest for Reproducibility 449.54954954954957
    00:00/00:00
  • Semiconductor Manufacturing 8. Semiconductor Manufacturing 459.09242575909246
    00:00/00:00
  • Copy Exactly! 9. Copy Exactly! 538.93893893893892
    00:00/00:00
  • Definitions 10. Definitions 574.77477477477476
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  • Process Ranges 11. Process Ranges 693.72706039372713
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  • Many ways to mesasure presure 12. Many ways to mesasure presure 770.63730397063728
    00:00/00:00
  • Vacuum Pressure Sensors Ranges 13. Vacuum Pressure Sensors Ranges 802.76943610276942
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  • The Ubiquitous Four 14. The Ubiquitous Four 851.5849182515849
    00:00/00:00
  • Pirani in the Market Place 15. Pirani in the Market Place 871.63830497163838
    00:00/00:00
  • MARTE, Mars Environment Simulation Chamber 16. MARTE, Mars Environment Simula… 903.2032032032032
    00:00/00:00
  • Hot Ionization Gauge 17. Hot Ionization Gauge 967.233900567234
    00:00/00:00
  • Hot Cathode Ion Gauge 18. Hot Cathode Ion Gauge 990.65732399065735
    00:00/00:00
  • Hot Ionization Ranges 19. Hot Ionization Ranges 1053.4868201534869
    00:00/00:00
  • INFICON Manufactured Bayard-Alpert Hot Ionization Gauges 20. INFICON Manufactured Bayard-Al… 1075.3086419753088
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  • Untitled: Slide 21 21. Untitled: Slide 21 1118.8855522188856
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  • Inverted Magnetron 22. Inverted Magnetron 1187.2872872872874
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  • Inverted Magnetron Ion Gauge 23. Inverted Magnetron Ion Gauge 1244.8782115448782
    00:00/00:00
  • Inverted Magnetrons 24. Inverted Magnetrons 1294.0607273940607
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  • Inverted Magnetron MPG550 25. Inverted Magnetron MPG550 1412.9462796129462
    00:00/00:00
  • Novel Magnet Design 26. Novel Magnet Design 1427.560894227561
    00:00/00:00
  • Low Magnetic Stray Field 27. Low Magnetic Stray Field 1457.590924257591
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  • External Magnetic Field 28. External Magnetic Field 1513.3133133133133
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  • Capacitance Diaphragm gauge 29. Capacitance Diaphragm gauge 1527.2272272272273
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  • Vacuum Measurement 30. Vacuum Measurement 1534.4344344344345
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  • Direct vacuum measurement (1) 31. Direct vacuum measurement (1) 1578.3450116783451
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  • Direct measurement of vacuum (2) 32. Direct measurement of vacuum (… 1590.7240573907241
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  • Direct measurement of vacuum 33. Direct measurement of vacuum 1594.9282615949282
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  • Membrane 34. Membrane 1620.1201201201202
    00:00/00:00
  • CDG Cell 35. CDG Cell 1651.0176843510178
    00:00/00:00
  • From C to a readout 36. From C to a readout 1703.1698365031698
    00:00/00:00
  • From C to a readout 37. From C to a readout 1740.7073740407075
    00:00/00:00
  • Capacitive Diaphragm Gauges 38. Capacitive Diaphragm Gauges 1792.4591257924592
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  • Innovative Portfolio 39. Innovative Portfolio 1839.6730063396731
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  • Functional Blocks of a CDG 40. Functional Blocks of a CDG 1915.3153153153153
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  • Effect of Process Contamination on CDG's 41. Effect of Process Contaminatio… 1960.6272939606274
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  • Process build-up on CDG's 42. Process build-up on CDG's 2049.7163830497166
    00:00/00:00
  • Observed Contaminations 43. Observed Contaminations 2075.0417083750417
    00:00/00:00
  • CR096-S 10T SN225/SN333 44. CR096-S 10T SN225/SN333 2111.0777444110777
    00:00/00:00
  • Design Improvements 45. Design Improvements 2168.8355021688358
    00:00/00:00
  • Issues 46. Issues 2228.4284284284286
    00:00/00:00
  • Goal 47. Goal 2242.4090757424092
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  • TiN Uses in Semiconductor Industry 48. TiN Uses in Semiconductor Indu… 2245.5455455455458
    00:00/00:00
  • TiN Process Basic Chemistry 49. TiN Process Basic Chemistry 2277.6443109776442
    00:00/00:00
  • By-product Reactions 50. By-product Reactions 2329.9966633299969
    00:00/00:00
  • Surface chemistry mechanism for TiN deposition 51. Surface chemistry mechanism fo… 2373.4734734734734
    00:00/00:00
  • Stream Function CVD Reactor 52. Stream Function CVD Reactor 2381.3146479813149
    00:00/00:00
  • Profiles of Mass Fractions 53. Profiles of Mass Fractions 2417.0503837170504
    00:00/00:00
  • Validation Results 54. Validation Results 2469.2692692692694
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  • Validation Results 55. Validation Results 2522.1221221221222
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  • Gauge Designs 56. Gauge Designs 2524.9916583249919
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  • TiCl4 + NH3 Process in a CDG 160A 57. TiCl4 + NH3 Process in a CDG 1… 2542.2422422422424
    00:00/00:00
  • Comparison Deposition Profile along Membrane 58. Comparison Deposition Profile … 2571.5715715715719
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  • 3D Pressure Profile During Pressure Change 59. 3D Pressure Profile During Pre… 2621.5882549215885
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  • Stress on Membrane as Function of Time 60. Stress on Membrane as Function… 2648.5485485485488
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  • Pressure/Knudsen Number (x, t) 61. Pressure/Knudsen Number (x, t) 2669.1024357691026
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  • Summary Dynamics 62. Summary Dynamics 2699.7330663997332
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  • Membrane Contamination 63. Membrane Contamination 2797.3640306973643
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  • Best Membrane Protection 64. Best Membrane Protection 2816.9502836169504
    00:00/00:00
  • Helical Baffle System 65. Helical Baffle System 2841.374708041375
    00:00/00:00
  • Process Drift Improvement 66. Process Drift Improvement 2867.6009342676011
    00:00/00:00
  • Summary of Simulation 67. Summary of Simulation 2901.4347681014347
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  • Small Scale CDGs 68. Small Scale CDGs 2915.2485819152489
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  • Untitled: Slide 69 69. Untitled: Slide 69 2954.8548548548551
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  • Pirani 70. Pirani 2966.3997330663997
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  • Thermal Conductivity Sensor 71. Thermal Conductivity Sensor 2973.6403069736402
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  • Pirani Sensor Elements 72. Pirani Sensor Elements 2990.09009009009
    00:00/00:00
  • Issues 73. Issues 3011.1111111111113
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  • Range Extensions 74. Range Extensions 3015.3153153153153
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  • Increasing the Upper Pressure Limit: 75. Increasing the Upper Pressure … 3048.4150817484151
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  • Increasing the Upper Pressure Limit: 76. Increasing the Upper Pressure … 3069.1691691691694
    00:00/00:00
  • Increasing the Upper Pressure Limit: 77. Increasing the Upper Pressure … 3093.8271604938273
    00:00/00:00
  • Reducing the Lower Pressure Limit 78. Reducing the Lower Pressure Li… 3116.1828495161831
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  • Reducing the Lower Pressure Limit 79. Reducing the Lower Pressure Li… 3123.39005672339
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  • A Comparison 80. A Comparison 3127.5608942275612
    00:00/00:00
  • Carbonized filament 81. Carbonized filament 3169.2025358692026
    00:00/00:00
  • Fluorine Etch of W Wire 82. Fluorine Etch of W Wire 3185.6189522856189
    00:00/00:00
  • W Filament 10 min in 40% HF Solution 83. W Filament 10 min in 40% HF So… 3194.9616282949619
    00:00/00:00
  • PSG502 Ni Filament with HF 84. PSG502 Ni Filament with HF 3222.2555889222558
    00:00/00:00
  • Pirani in liquid (!) HF 85. Pirani in liquid (!) HF 3233.2665999332667
    00:00/00:00
  • Critical Materials: ZnO 86. Critical Materials: ZnO 3244.0440440440443
    00:00/00:00
  • Accuracy PSG vs. PCG 87. Accuracy PSG vs. PCG 3265.2652652652655
    00:00/00:00
  • Insufficient Corrosion Resistance 88. Insufficient Corrosion Resista… 3296.73006339673
    00:00/00:00
  • What is the Ceramic Coated sensor? 89. What is the Ceramic Coated sen… 3314.0140140140143
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  • Testing 90. Testing 3324.6913580246915
    00:00/00:00
  • Testing 91. Testing 3341.2412412412414
    00:00/00:00
  • Wireless Pressure Sensing 92. Wireless Pressure Sensing 3343.61027694361
    00:00/00:00
  • Manufacturing 93. Manufacturing 3395.2619285952619
    00:00/00:00
  • Manufacturing: Automation 94. Manufacturing: Automation 3402.5025025025025
    00:00/00:00
  • Manufacturing: SPC Pirani 95. Manufacturing: SPC Pirani 3412.2789456122791
    00:00/00:00
  • Manufacturing: Optical Inspection Tool 96. Manufacturing: Optical Inspect… 3420.2535869202538
    00:00/00:00
  • Factory Calibration 97. Factory Calibration 3424.6913580246915
    00:00/00:00
  • Optical Methods 98. Optical Methods 3434.2342342342345
    00:00/00:00
  • NIST FLOC 99. NIST FLOC 3506.1728395061727
    00:00/00:00
  • NIST FLOC 100. NIST FLOC 3568.7020353687021
    00:00/00:00
  • NIST FLOC 101. NIST FLOC 3577.7777777777778
    00:00/00:00
  • University of Umea: GAMOR 102. University of Umea: GAMOR 3628.5618952285622
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  • Summary 103. Summary 3761.5615615615616
    00:00/00:00
  • Summary 104. Summary 3878.7454120787456
    00:00/00:00
  • Vacuum Control in Liechtenstein 105. Vacuum Control in Liechtenstei… 3888.355021688355
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