Density Functional Tight Binding (DFTB) Modeling in the Context of Ultra-Thin Silicon-on-Insulator MOSFETs

By Stanislav Markov

Department of Chemistry, The University of Hong Kong

Published on

Abstract

IWCE 2015 presentation.

We investigate the applicability of density functional tight binding (DFTB) theory [1][2], coupled to non-equilibrium Green functions (NEGF), for atomistic simulations of ultra-scaled electron devices, using the DFTB+ code [3][4]. In the context of ultra-thin silicon-on-insulator (SOI) transistors we adopt atomic models that include not only the Si channel, but also the interfacial SiO2, and look at the change of electronic, dielectric and transport properties as Si film thickness is reduced from 10 nm to less than 1 nm. We build on our previous reports [5][6], and draw a systematic comparison against a corresponding model that employs H-passivation of the channel, and against known experiment.

Credits

In collaboration with Y.H. Kwok*, B. Aradi+, G. Penazzi+, C.Y. Yam*, H. Xie*, A. Pecchia&, T. Frauenheim+ and G.H. Chen, *Department Chemistry, The University of Hong Kong, +BCCMS, The University of Bremen, Germany, &Department of Engineering, Univ. “Tor Vergata”, Rome, Italy

Sponsored by

References

[1] [T. Frauenheim et al, J. Phys. Cond. Matt 14 3015 (2002). [2] M. Elstner et al, Phys. Rev. B 58 7260 (1998). [3] A. Pecchia et al, New J. Phys. 10 065022 (2008). [4] B. Aradi et al, J. Phys. Chem. A 111 5678 (2007) (www.dftb-plus.info). [5] S. Markov et al, Proc. SISPAD 65 (2014). [6] S. Markov et al, IEEE Trans. Elec. Dev. 62 696 (2015).

Cite this work

Researchers should cite this work as follows:

  • Markov, Stanislav, "Density Functional Tight Binding (DFTB) Modeling in the Context of Ultra-Thin Silicon-on-Insulator MOSFETs," in Computational Electronics (IWCE) 2015 International Workshop on, DOI: Not available in IEEE Xplore digital library. Full Website Here

  • Stanislav Markov (2015), "Density Functional Tight Binding (DFTB) Modeling in the Context of Ultra-Thin Silicon-on-Insulator MOSFETs," https://nanohub.org/resources/22908.

    BibTex | EndNote

Time

Location

North Ballroom, PMU, Purdue University, West Lafayette, IN

Tags

Density Functional Tight Binding (DFTB) Modeling in the Context of Ultra-Thin Silicon-on-Insulator MOSFETs
  • Density functional tight binding (DFTB) modeling in the context of ultra-thin silicon-on-insulator MOSFETs 1. Density functional tight bindi… 0
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  • From atom to transistor: Can we? 2. From atom to transistor: Can w… 26.493159826493162
    00:00/00:00
  • State of the art atomistic modelling of MOSFETs: What about the oxide? 3. State of the art atomistic mod… 58.858858858858859
    00:00/00:00
  • General approach and choice of Hamiltonian 4. General approach and choice of… 132.69936603269937
    00:00/00:00
  • Outline 5. Outline 178.74541207874543
    00:00/00:00
  • DFTB Part I: Energy functional 6. DFTB Part I: Energy functional 198.43176509843178
    00:00/00:00
  • DFTB Part II: Reference Hamiltonian 7. DFTB Part II: Reference Hamilt… 245.54554554554557
    00:00/00:00
  • DFTB Part III: Self-Consistent Charges 8. DFTB Part III: Self-Consistent… 309.3093093093093
    00:00/00:00
  • DFTB ...take away message 9. DFTB ...take away message 403.26993660326997
    00:00/00:00
  • DFTB parameterisation for Si: public state of the art 10. DFTB parameterisation for Si: … 443.54354354354354
    00:00/00:00
  • DFTB parameterization for Si: this work 11. DFTB parameterization for Si: … 457.45745745745745
    00:00/00:00
  • DFTB parameterisation for Alpha-quartz SiO2 12. DFTB parameterisation for Alph… 463.93059726393062
    00:00/00:00
  • Atomic models for SOI: Si/SiO2 or SiO2/Si/SiO2/vacuum supercells 13. Atomic models for SOI: Si/SiO2… 485.91925258591925
    00:00/00:00
  • Si Band-gap vs Si film thickness 14. Si Band-gap vs Si film thickne… 522.98965632298973
    00:00/00:00
  • Conduction/Valence Band shifts vs Si thickness 15. Conduction/Valence Band shifts… 557.82449115782447
    00:00/00:00
  • The MOS Structure and DOS (towards tunnelling current calculations) 16. The MOS Structure and DOS (tow… 594.46112779446116
    00:00/00:00
  • Band-gap vs distance from interface: ETSOI 17. Band-gap vs distance from inte… 632.16549883216555
    00:00/00:00
  • Permittivity vs Si film thickness 18. Permittivity vs Si film thickn… 646.84684684684692
    00:00/00:00
  • Device structure: Simplified SOI FET 19. Device structure: Simplified … 724.89155822489158
    00:00/00:00
  • Device structure – atomistic domain: 20. Device structure – atomistic… 777.84451117784454
    00:00/00:00
  • IDVG – H- vs SiO2-passivation 21. IDVG – H- vs SiO2-passivatio… 808.641975308642
    00:00/00:00
  • Model vs. Experiment 22. Model vs. Experiment 867.80113446780115
    00:00/00:00
  • Conclusions 23. Conclusions 929.99666332999675
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  • Acknowledgements 24. Acknowledgements 965.76576576576576
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