Profile

• Organization

  University of the Basque Country UPV/EHU

  
  
• Website

  http://dipc.ehu.es/

  
  
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• Interests

  1. kinetic monte carlo
  2. Monte Carlo

  
  
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• Biography

  Miguel A. Gosálvez received the M.S. degree (licentiate) in Material Physics in 1996 from Universidad Complutense de Madrid, Spain, and the Ph.D. degree in Computational Physics from Helsinki University of Technology (HUT), Finland, in 2003. He was a COE Research Scientist and Assist. Prof. at the Department of Micro-Nano Systems Engineering, Nagoya University, Japan in 2004-2007 and a postdoctoral researcher in the Laboratory of Physics, HUT in 2007-2008. His research focuses on the simulation of surface processes such as anisotropic etching, reactive ion etching, epitaxial growth and heterogeneous catalysis using kinetic Monte Carlo and Cellular Automata methods with an aim at the fundamental understanding and the practical simulation of the processes for engineering applications. He is one of the authors of IntelliEtch, an advanced wet etching simulator commercialized worldwide by IntelliSense Software Corp. Presently, he is a Ramón y Cajal Fellow Scientist at the Dept. of Materials Physics, Univ. of the Basque Country and Donostia International Physics Center in San Sebastian, Spain.