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Intro to MOS-Capacitor Tool
Tools | 09 Jan 2013 | Contributor(s):: Emmanuel Jose Ochoa, Stella Quinones
Understanding the effect of silicon doping, oxide (SiO2) thickness, gate type (n+poly/p+poly), and semiconductor type (n-type/p-type) on the flatband voltage, threshold voltage, surface potential and oxide voltage of a MOS-Capacitor.
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Mobility and Resistivity Tool
Tools | 15 Jun 2012 | Contributor(s):: Ivan Santos, Stephanie Michelle Sanchez, Stella Quinones
Understand how doping affects mobility and resistivity.
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Carrier Concentration
Tools | 13 Jun 2012 | Contributor(s):: Stephanie Michelle Sanchez, Ivan Santos, Stella Quinones
Calculate the carrier concentration for a semiconductor material as a function of doping and temperature.
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Minority Carrier Diffusion Equation (MCDE) Tool
Tools | 26 Apr 2012 | Contributor(s):: Ivan Santos, Stella Quinones
Apply the Minority Carrier Diffusion Equation (MCDE) to model excess carrier concentration as a function of time or distance.
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Semiconductor Doping
Tools | 11 Apr 2012 | Contributor(s):: Ivan Santos, Stella Quinones
Understand N-Type and P-Type Semiconductor Doping.
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Archimedes, GNU Monte Carlo simulator
Tools | 29 May 2008 | Contributor(s):: Jean Michel D Sellier
GNU Monte Carlo simulation of 2D semiconductor devices, III-V materials
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Effect of Doping on Semiconductors
Tools | 10 Sep 2008 | Contributor(s):: Umberto Ravaioli, Nahil Sobh, Mohamed Mohamed
effects of doping in bulk silicon.
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Introduction to Solid State Electronic Devices Classes Tools
Tools | 26 Jul 2008 | Contributor(s):: Mohamed Mohamed, Nahil Sobh, Kyeong-hyun Park
Tools to complement Illinois Solid State Electronic Devices Classes
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tsuprem4
Tools | 30 Apr 2007 | Contributor(s):: Steven Clark
TSUPREM-4 is a computer program for simulating the processing steps used in the manufacture of silicon integrated circuits and discrete devices.
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Process Lab: Defect-coupled diffusion
Tools | 09 Oct 2006 | Contributor(s):: Shuqing (Victor) Cao, Yang Liu, Peter Griffin
This tool simulates dopant diffusion coupled with point defects.
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Process Lab: Concentration-Dependent Diffusion
Tools | 09 Oct 2006 | Contributor(s):: Shuqing (Victor) Cao, Yang Liu, Peter Griffin
This modules simulates both the standard diffusion and concentration-dependent diffusion.
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Process Lab:Oxidation
Tools | 09 Oct 2006 | Contributor(s):: Shuqing (Victor) Cao, Yang Liu, Peter Griffin
Integrated Circuit Fabrication Process Simulation
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Process Lab: Oxidation Flux
Tools | 09 Oct 2006 | Contributor(s):: Shuqing (Victor) Cao, Yang Liu, Peter Griffin
This module simulates the oxidation flux.
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PN Junction Lab
Tools | 12 Sep 2005 | Contributor(s):: Dragica Vasileska, Matteo Mannino, Michael McLennan, Xufeng Wang, Gerhard Klimeck, Saumitra Raj Mehrotra, Benjamin P Haley
This tool enables users to explore and teach the basic concepts of P-N junction devices.