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ME 290R Lecture 2.1: Lithography Performance Criteria - Technical
Online Presentations | 27 Mar 2019 | Contributor(s):: Taylor, Hayden
Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.
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ME 290R Lecture 2.2: Lithography Performance Criteria - Technical (Yield Modeling)
Online Presentations | 27 Mar 2019 | Contributor(s):: Taylor, Hayden
Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.
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Tutorial on Two Photon Lithography Tool
Online Presentations | 26 Nov 2018 | Contributor(s):: Mohammad Mahfuzul Kabir, Varun Ajit Kelkar
Two-photon lithography (TPL) is a nano-scale 3-d fabrication technique. TPL depends upon the two-photon polymerization process, whereby two incident photons of light are absorbed by a precursor material leading to polymerization. The smallest feature size (voxel) achievable in a TPL...
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Two Photon Lithography
Tools | 06 Jul 2018 | Contributor(s):: Mohammad Mahfuzul Kabir, Varun Ajit Kelkar, Darren K Adams, Kimani C Toussaint
Calculate voxel dimensions for a two-photon lithography process
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Adam Marc Munder
https://nanohub.org/members/165406
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ECE 695Q Lecture 42: Advanced Lithography II
Online Presentations | 02 Dec 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 43: Advanced Lithography III
Online Presentations | 01 Nov 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 41: Advanced Lithography I
Online Presentations | 12 Oct 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 38: Nanoimprint Lithography (NIL) – NIL Mold Fabrication
Online Presentations | 12 Oct 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 37: Nanoimprint Lithography (NIL) - Resist for UV-NIL
Online Presentations | 12 Oct 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 36: Nanoimprint Lithography (NIL) – Alignment in NIL
Online Presentations | 28 Sep 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 39: Nanoimprint Lithography (NIL) – NIL Tools
Online Presentations | 26 Sep 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 40: Nanoimprint Lithography (NIL) – Other NIL Approaches
Online Presentations | 26 Sep 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 32: Nanoimprint Lithography (NIL) – Overview and Thermal NIL Resists
Online Presentations | 21 Sep 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 33: Nanoimprint Lithography – Residual Layer After Nanoimprint
Online Presentations | 21 Sep 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 34: Nanoimprint Lithography – Pattern Dependence in Nanoimprint
Online Presentations | 21 Sep 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 35: Nanoimprint Lithography – UV Assisted Nanoimprint
Online Presentations | 21 Sep 2016 | Contributor(s):: Minghao Qi
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ECE 695Q Lecture 21: E-Beam Lithography Process
Online Presentations | 20 Sep 2016 | Contributor(s):: Minghao Qi
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ECE 695Q: Nanometer Scale Patterning and Processing
Courses | 11 Jul 2016 | Contributor(s):: Minghao Qi
This course is a top-down approach to the fabrication of nanometer-scale (<100nm) structures. Principles of lithography, film deposition, reactive-ion etch and planarization are presented. The couse provides a survey of state-of-the-art nanofabrication techniques.
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ECE 695Q Lecture 16: Electron Optics and Lithography I
Online Presentations | 29 Jun 2016 | Contributor(s):: Minghao Qi