CMOS+X: Integrated Ferroelectric Devices for Energy Efficient Electronics
CMOS+X: Integrated Ferroelectric Devices for Energy Efficient Electronics
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1. Integrated Ferroelectric Devic…
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2. Information Processing
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3. Need for Energy Efficiency in …
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4. Functional Materials for Energ…
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5. Minimum Energy Dissipation in …
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6. Overcoming Boltzmann Tyranny
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7. Overcoming Boltzmann Tyranny
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8. Dipolar Ordering and Ferroelec…
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9. Negative Capacitance: Origin
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10. Negative Capacitance: Origin
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11. Negative Capacitance: Origin
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12. Negative Capacitance: Energy c…
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13. Negative Capacitance: Energy c…
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14. Negative Capacitance: Energy c…
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15. Less energy at same Q
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16. Less energy at same Q
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17. Changing the Field Effect in a…
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18. Negative Capacitance
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19. Enhancement of Capacitance
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20. Microscopic imaging of negativ…
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21. Microscopic Imaging of Negativ…
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22. From Physics to Materials
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23. A Non-perovskite Ferroelectric…
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24. Ultra thin Ferroelectrics
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25. World's Thinnest Ferroelectric…
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26. How thin can one go?
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27. Advanced Devices with NC gate …
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28. Advanced Devices with NC Gate …
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29. Negative Capacitance Gate Oxid…
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30. MIT-LL Process Flow
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31. Negative Capacitance in HZH | …
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32. Lg = 90 nMOS Ion benchmarking
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33. Going Beyond Logic Transistors
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34. Device Physics of the FE Gate …
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35. A Different Use of Negative Ca…
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36. A Different Use of Negative Ca…
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37. Optimizing the IL Layer
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38. Record Performance on a Memory…
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39. Compute in Memory
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40. Negative Capacitance for Energ…
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41. Negative Capacitance
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42. From Physics, Materials to Dev…
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43. A Vision for the Future Inform…
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44. Looking Forward: Open Platform…
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