ME 290R Lecture 13.2: Emerging X-ray and Optical-based Lithography Techniques II

By Taylor, Hayden

Mechanical Engineering, University of California at Berkeley, Berkeley, CA

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  • Taylor, Hayden (2019), "ME 290R Lecture 13.2: Emerging X-ray and Optical-based Lithography Techniques II," https://nanohub.org/resources/30517.

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  1. lithography
  2. nanomanufacturing
  3. nanoMFG Node
  4. optical lithography
  5. processing
  6. x-ray lithography
ME 290R Lecture 13.2: Emerging X-ray and Optical-based Lithography Techniques II
  • ME290R:  Topics  in  Manufacturing 1. ME290R:  Topics  in  Manufa… 0
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  • Three-dimensional photopolymerized microstructures 2. Three-dimensional photopolymer… 10.944277610944278
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  • Relevant extra-cellular matrix length-scales and stiffnesses 3. Relevant extra-cellular matrix… 38.238238238238239
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  • 2-D 4. 2-D 535.43543543543547
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  • 3-D 5. 3-D 622.45578912245583
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  • 3D Holographic Lithography 6. 3D Holographic Lithography 757.05705705705714
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  • Can a diffractive element be designed to pattern 7. Can a diffractive element be d… 866.86686686686687
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  • Hologram and lens are superimposed 8. Hologram and lens are superimp… 1005.7390724057391
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  • The Gerchberg-Saxton algorithm 9. The Gerchberg-Saxton algorithm 1189.5562228895562
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