ME 290R Lecture 12.2: Scanning-beam Lithography and Directed Self-assembly II

By Taylor, Hayden

Mechanical Engineering, University of California at Berkeley, Berkeley, CA

Published on

Cite this work

Researchers should cite this work as follows:

  • Taylor, Hayden (2019), "ME 290R Lecture 12.2: Scanning-beam Lithography and Directed Self-assembly II," https://nanohub.org/resources/30499.

    BibTex | EndNote

Time

Tags

ME 290R Lecture 12.2: Scanning-beam Lithography and Directed Self-assembly II
  • Lecture 12.2: Scanning-­‐beam  Lithography and Directed Self-­‐assembly II 1. Lecture 12.2: Scanning-­‐be… 0
    00:00/00:00
  • Methods of defining patterns 2. Methods of defining patterns 11.344678011344678
    00:00/00:00
  • Could e-beam lithography challenge photolithography? 3. Could e-beam lithography chall… 230.26359693026362
    00:00/00:00
  • Parallelized e-beam systems in development 4. Parallelized e-beam systems in… 277.01034367701033
    00:00/00:00
  • Scalpel 5. Scalpel 291.55822489155821
    00:00/00:00
  • The MAPPER system 6. The MAPPER system 560.82749416082754
    00:00/00:00
  • REBL (Reflective e-Beam Lithography) 7. REBL (Reflective e-Beam Lithog… 736.33633633633633
    00:00/00:00
  • Economics of e-beam lithography 8. Economics of e-beam lithograph… 922.92292292292291
    00:00/00:00
  • Agenda 9. Agenda 945.37871204537873
    00:00/00:00
  • Block copolymers for directed self-assembly 10. Block copolymers for directed … 1012.1788455121789
    00:00/00:00
  • Blending DSA and e-beam lithography 11. Blending DSA and e-beam lithog… 1425.291958625292
    00:00/00:00
  • Graphoepitaxy for contact hole multiplication 12. Graphoepitaxy for contact hole… 1794.4944944944946
    00:00/00:00
  • Graphoepitaxy for contact hole multiplication 13. Graphoepitaxy for contact hole… 1877.7777777777778
    00:00/00:00
  • Using NIL to guide block copolymer organization 14. Using NIL to guide block copol… 1936.8368368368369
    00:00/00:00