ME 290R Lecture 11: Extreme UV Lithography

By Taylor, Hayden

Mechanical Engineering, University of California at Berkeley, Berkeley, CA

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Researchers should cite this work as follows:

  • Taylor, Hayden (2019), "ME 290R Lecture 11: Extreme UV Lithography," https://nanohub.org/resources/30497.

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ME 290R Lecture 11: Extreme UV Lithography
  • Lecture 11: Extreme UV Lithography 1. Lecture 11: Extreme UV Lithogr… 0
    00:00/00:00
  • outline 2. outline 7.9746413079746414
    00:00/00:00
  • Vacuum Ultraviolet Transmission Cutoffs 3. Vacuum Ultraviolet Transmissio… 13.279946613279947
    00:00/00:00
  • EUV 13.5 nm Projection 4. EUV 13.5 nm Projection 23.990657323990657
    00:00/00:00
  • EUVL Engineering Test Stane 5. EUVL Engineering Test Stane 230.93093093093094
    00:00/00:00
  • NXE platform improving with NXE:3300B system 6. NXE platform improving with NX… 240.5739072405739
    00:00/00:00
  • EUV mask structure 7. EUV mask structure 241.57490824157492
    00:00/00:00
  • Phase-shift Mask Techniques 8. Phase-shift Mask Techniques 654.2876209542876
    00:00/00:00
  • EUV Advantages and Challenges 9. EUV Advantages and Challenges 655.02168835502175
    00:00/00:00
  • EUVL simplifies process and reduces cost 10. EUVL simplifies process and re… 656.55655655655653
    00:00/00:00