ME 290R Lecture 10.3: Photolithography III

By Taylor, Hayden

Mechanical Engineering, University of California at Berkeley, Berkeley, CA

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  • Taylor, Hayden (2019), "ME 290R Lecture 10.3: Photolithography III," https://nanohub.org/resources/30437.

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ME 290R Lecture 10.3: Photolithography III
  • Lecture 10.3: Photolithography III 1. Lecture 10.3: Photolithography… 0
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  • Unrestricted Layout circa 1985 2. Unrestricted Layout circa 1985 14.714714714714715
    00:00/00:00
  • Restricted Layouts to aid Lithography 3. Restricted Layouts to aid Lith… 163.39673006339675
    00:00/00:00
  • Highly Restricted Layout 4. Highly Restricted Layout 491.65832499165833
    00:00/00:00
  • Resolution enhancement: Optical proximity correction 5. Resolution enhancement: Optica… 576.54320987654319
    00:00/00:00
  • Photolithography: optical proximity 6. Photolithography: optical prox… 578.31164497831162
    00:00/00:00
  • Photolithography: simulation 7. Photolithography: simulation 765.86586586586589
    00:00/00:00
  • OPC Scatterbars or Assist Features 8. OPC Scatterbars or Assist Feat… 831.79846513179848
    00:00/00:00
  • Resolution enhancement: Future trends? 9. Resolution enhancement: Future… 948.51518184851523
    00:00/00:00
  • Two-photon free radical polymerization 10. Two-photon free radical polyme… 1288.7887887887889
    00:00/00:00
  • Two-photon free radical polymerization 11. Two-photon free radical polyme… 2018.818818818819
    00:00/00:00
  • Stimulated emission depletion lithography 12. Stimulated emission depletion … 2102.5025025025025
    00:00/00:00
  • Two-color , single-photon sub-diffraction patterning 13. Two-color , single-photon sub-… 2517.2839506172841
    00:00/00:00