ME 290R Lecture 10.2: Photolithography II

By Taylor, Hayden

Mechanical Engineering, University of California at Berkeley, Berkeley, CA

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  • Taylor, Hayden (2019), "ME 290R Lecture 10.2: Photolithography II," https://nanohub.org/resources/30432.

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  1. lithography
  2. nanomanufacturing
  3. nanoMFG Node
  4. photolithography
  5. processing
ME 290R Lecture 10.2: Photolithography II
  • Lecture 10.2: Photolithography II 1. Lecture 10.2: Photolithography… 0
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  • Step 4: exposure Image reversal resists 2. Step 4: exposure Image reversa… 36.102769436102768
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  • Step 4: exposure Image reversal resists 3. Step 4: exposure Image reversa… 94.861528194861535
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  • Step 4: exposure Contrast 4. Step 4: exposure Contrast 720.72072072072069
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  • Step 4: exposure Focus-exposure grids 5. Step 4: exposure Focus-exposur… 1035.5355355355355
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  • Steps 5-7: development, descum and 6. Steps 5-7: development, descum… 1531.1978645311979
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  • What a Deep-UV Stepper Really Looks Like 7. What a Deep-UV Stepper Really … 1899.1991991991993
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  • Photolithography equipment: steppers 8. Photolithography equipment: st… 2136.0694027360696
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  • Photolithography equipment: coater tracks 9. Photolithography equipment: co… 2559.3259926593259
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  • Resolution enhancement: Multiple patterning 10. Resolution enhancement: Multip… 2645.1451451451453
    00:00/00:00
  • Process scheme of Self aligined DP 11. Process scheme of Self aligine… 2783.3833833833837
    00:00/00:00
  • Gratings Next Steps - Pitch/6 12. Gratings Next Steps - Pitch/6 3117.7177177177177
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