ME 290R Lecture 10.1: Photolithography I

By Taylor, Hayden

Mechanical Engineering, University of California at Berkeley, Berkeley, CA

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  • Taylor, Hayden (2019), "ME 290R Lecture 10.1: Photolithography I," https://nanohub.org/resources/30431.

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  1. lithography
  2. nanomanufacturing
  3. nanoMFG Node
  4. photolithography
  5. processing
ME 290R Lecture 10.1: Photolithography I
  • Lecture 10.1: Photolithography I 1. Lecture 10.1: Photolithography… 0
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  • Photolithography: outline 2. Photolithography: outline 127.12712712712714
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  • The importance of lithography 3. The importance of lithography 152.95295295295296
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  • Step 1: adhesion promotion ( 4. Step 1: adhesion promotion ("p… 190.82415749082418
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  • Step 1: adhesion promotion ( 5. Step 1: adhesion promotion ("p… 399.33266599933268
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  • Step 2: resist spinning 6. Step 2: resist spinning 549.84984984984987
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  • Step 3: pre-bake 7. Step 3: pre-bake 1700.7340674007342
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  • Step 4: exposure 8. Step 4: exposure 1760.593927260594
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  • Step 4: exposure Resolution limitations 9. Step 4: exposure Resolution li… 2375.5755755755758
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  • Step 4: exposure 10. Step 4: exposure 2423.5235235235236
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  • Step 4: exposure 11. Step 4: exposure 2425.1584918251588
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  • Step 4: exposure Resolution limitations: proximity 12. Step 4: exposure Resolution li… 2428.3283283283286
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  • Step 4: exposure Modulation transfer function (MTF) 13. Step 4: exposure Modulation tr… 2506.74007340674
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  • Step 4: exposure Contrast 14. Step 4: exposure Contrast 2836.7033700367033
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