ME 290R Lecture 7.2: Nanoimprint Lithography – Applications II
ME 290R Lecture 7.2: Nanoimprint Lithography – Applications II
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1. Lecture 7.2: Nanoimprint Litho…
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2. Sol-gel processing
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3. SCIL imprinted silica sol-gel …
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4. SCIL offers nm resolution
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5. Substrate conformal: no stamp …
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6. Pattern deformations: Master v…
184.5845845845846
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7. Sol-gel (etch) mask
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8. Polarization stabilized VCSEL
331.56489823156494
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9. Bilayer Wire-grid Polarizer
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10. Large area photo voltaic appli…
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11. Applications in Organic Electr…
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12. OLED brightness enhancement
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13. Fluorescence enhancement in DN…
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14. Fluorescence enhancement in DN…
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15. Surface acoustic wave filters
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16. 9 GHz resonance frequency SAW …
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