Description

The aim of the nanoMFG Node, hosted at the University of Illinois at Urbana-Champaign (UIUC) in partnership with the University of California at Berkeley, is to develop computational software tools aimed at creating smart, model-driven and experimentally informed nanomanufactured structures and devices. To simulate every step of the manufacturing process of a nano-enabled product. The node’s mission is to be the engine for design, simulation, planning, and optimization of nano-manufacturing processes. This will be accomplished by developing tools using a layered computational infrastructure comprising nanoscale transport phenomena models, process models, uncertainty quantification framework, application and empirical validation of process models, tools for multiscale transport phenomena, and tools for nanoscale self-assembly.

All Categories (81-100 of 102)

1. ME 290R Lecture 3.4: Nanoimprint Lithography - Process Mechanics IV

   Online Presentations | 02 Apr 2019 | Contributor(s):: Taylor, Hayden

2. Manufacturing at the Nanoscale: Challenges and Opportunities

   Online Presentations | 28 Mar 2019 | Contributor(s):: Placid M. Ferreira, Jay R Roloff

3. Engineering-Driven Data Analytics for in-situ Process Monitoring of Nanomanufacturing

   Online Presentations | 28 Mar 2019 | Contributor(s):: Jianjun Shi

4. ME 290R: Topics in Manufacturing - Nanoscale Manipulation of Materials

   Courses | 27 Mar 2019 | Contributor(s):: Taylor, Hayden

   This graduate level course surveys sub-micrometer pattern-transfer techniques with applications in semiconductor manufacturing, data storage, photonics, and surface engineering.

5. ME 290R Lecture 1: Introduction

   Online Presentations | 27 Mar 2019 | Contributor(s):: Taylor, Hayden

   An overview of current and emerging lithography technologies and challenges. Future lithography requirements (with reference to the International Technology Roadmap for Semiconductors). Requirements for integration of lithography with other process steps.

6. ME 290R Lecture 2.1: Lithography Performance Criteria - Technical

   Online Presentations | 27 Mar 2019 | Contributor(s):: Taylor, Hayden

   Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.

7. ME 290R Lecture 2.2: Lithography Performance Criteria - Technical (Yield Modeling)

   Online Presentations | 27 Mar 2019 | Contributor(s):: Taylor, Hayden

   Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.

8. Introduction to the NSF Nanomanufacturing Node

   Online Presentations | 20 Mar 2019 | Contributor(s):: Kimani C Toussaint

9. KiriGAMI Design and Analysis Tutorial

   Online Presentations | 26 Feb 2019 | Contributor(s):: Subhadeep De

   GAMIAN is a design and mechanical ANalysis tool for KiriGAMI structures. Starting from designing cuts or incisions on any thin-film structure to solving for its final deformed configuration under planar loading, all the steps can be carried out using GAMIAN. GAMIAN provides...

10. Composite Filament Simulation 3D

    Tools | 15 Feb 2019 | Contributor(s):: Zachary Yun, Michelle Zhang, Ganesh Vurimi, Hayden Taylor, Sixian Jia

    Simulate electrical properties of a nanowire composite filament.

11. Kirigami Design and Analysis

    Tools | 28 Jan 2019 | Contributor(s):: Subhadeep De, Darren K Adams

    Design and mechanical analysis of Kirigami structures

12. ME 498 Lecture 4: Methods and Philosophy of SPC

    Online Presentations | 06 Dec 2018 | Contributor(s):: Chenhui Shao

13. ME 498 Lecture 7: Measurement System Analysis

    Online Presentations | 06 Dec 2018 | Contributor(s):: Chenhui Shao

14. ME 498 Lecture 8: Quality Control in Today's Manufacturing

    Online Presentations | 06 Dec 2018 | Contributor(s):: Chenhui Shao

15. ME 498: Manufacturing Data and Quality Systems

    Courses | 06 Dec 2018 | Contributor(s):: Chenhui Shao

    ME 498 is a new manufacturing course developed by Dr. Shao. The goal of this course is to provide students, including upper-level undergraduate and graduate students with state-of-the-art manufacturing analytics tools with a focus on quality control applications.

16. Design, Fabrication, and Characterization of 3D Hollow Ceramic Nano-Architectures

    Online Presentations | 06 Dec 2018 | Contributor(s):: Dongchan Jang

    In this work, we present a new design criterion capable of significantly abating strength degradation in lightweight materials, by successfully combining size-induced strengthening effect in nanomaterials with architectural design of cellular porous materials. Hollow-tube-based 3D ceramic...

17. Tutorial on Two Photon Lithography Tool

    Online Presentations | 26 Nov 2018 | Contributor(s):: Mohammad Mahfuzul Kabir, Varun Ajit Kelkar

    Two-photon lithography (TPL) is a nano-scale 3-d fabrication technique. TPL depends upon the two-photon polymerization process, whereby two incident photons of light are absorbed by a precursor material leading to polymerization. The smallest feature size (voxel) achievable in a TPL...

18. SEM Image Processing Tool

    Tools | 02 Oct 2018 | Contributor(s):: Joshua A Schiller, Matthew Glen Robertson, Kristina M Miller, Kevin James Cruse, Kevin Liu, Darren K Adams, Benjamin Galewsky, Elif Ertekin, Sameh H Tawfick

    Analysis and feature detection in SEM images of Graphene.

19. Graphene Nanopore Drilling

    Tools | 27 Sep 2018 | Contributor(s):: Jae Hyun Park, Darren K Adams, Narayan Aluru

    Drilling a nanopore in graphene by Si-nanoparticle bombardment

20. Two Photon Lithography

    Tools | 06 Jul 2018 | Contributor(s):: Mohammad Mahfuzul Kabir, Varun Ajit Kelkar, Darren K Adams, Kimani C Toussaint

    Calculate voxel dimensions for a two-photon lithography process