This tool simulates the temperature distribution of a moving substrate material prior to plasma treatment in a roll-to-roll plasma chemical vapor deposition system.

Researchers should cite this work as follows:

• Yudong Chen, Majed Abdullah Alrefae, Timothy S Fisher (2016), "1D Moving Fin Model," https://nanohub.org/resources/fin. (DOI: 10.4231/D3RB6W36P).

  BibTex | EndNote

1. chemical vapor deposition (CVD)
2. plasma
3. temperature