[[Image(Image_moscap.png, 450px)]]

By completing the MOSCap Lab in [[Resource(5065)]], users will be able to a) understand the operation of a Metal-Oxide-Semiconductor using energy band diagrams, b) study the effects of interface traps, work function, oxide thickness, etc. on capacitance-voltage output, and c) understand MOS-C C-V characteristics in low and high frequency limits.


The specific objectives of the MOSCap Lab are:

[[Image(moscap_scheme.png, 400px)]]
 


== Recommended Reading ==

If you have not had experience with the MOS-C operation , here is a list of resources that will help you have the required knowledge to get the most of these issues resolved: 

1. Rober F. Pierret. (1996). ''Semiconductor Device Fundamentals''. Reading, MA: Addison-Wesley. (See especially chapter 16)

== Demo ==

* [[Resource(6546)]]

* [[Resource(6827)]]



== Theoretical Descriptions ==

* [[Resource(7224)]] (tutorial)

* [[Resource(8576)]] 

* [[Resource(8573)]] 

* [[Resource(8570)]] 

* [[Resource(5894)]] 

* [[Resource(5896)]] 

* [[Resource(5898)]] 

* [[Resource(5087)]] 


== Tool Verification ==

* [[Resource(9504)]] 


== Examples ==

*  [[Resource(9575)]] 


== Exercises and Homework Assignments ==

1.  [[Resource(7186)]] 

2.  [[Resource(4855)]] 

== Solutions to Exercises ==

Solutions are provided only to instructors!

== Evaluation ==

* [[Resource(9525)]] 

== Challenge ==

* [[Resource(10359)]]