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tsuprem4

This resource has a 10.0 Ranking

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Usage Stats
Overall Period: Updated 28 Aug, 2008
Users: 414
Jobs: 60287
Avg. exec. time: 2 mins
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Google/IEEE
Avg. Review: 0.0 out of 5 stars
Citations: 0

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Available Versions

Version 1.2 - published on 15 Jul, 2008
Contributor(s) Steven Clark
Purdue University, West Lafayette
At a glance TSUPREM-4 is a computer program for simulating the processing steps used in the manufacture of silicon integrated circuits and discrete devices.
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Description

TSUPREM-4 is a computer program for simulating the processing steps used in the manufacture of silicon integrated circuits and discrete devices. The types of processing steps modeled by the current version of the program include ion implantation, inert ambient drive-in, silicon and polysilicon oxidation and silicidation, epitaxial growth, and low temperature deposition and etching of various materials.

Because of the way this software is licensed, it is available only to users on the West Lafayette campus of Purdue University. Note that you must use a network connection on campus, or else you will get an "access denied" message.

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TSUPREM-4 licensed from Synopsys, Inc.

Credits

User interface for launching simulations and analyzing results created by Steve Clark.

Cite this work

If you reference this work in a publication, please cite as follows:

  • Clark, Steven (2007), "tsuprem4," doi: 10254/nanohub-r2657.3.

    BibTex | EndNote

In addition, we would appreciate it if you would add the following acknowledgment to your publication:

  • Simulation services for results presented here were provided by the Network for Computational Nanotechnology (NCN) at nanoHUB.org
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