Mobility Variation Due to Interface Trap Generation in Plasma Oxynitrided PMOS Devices
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| Contributor(s) | Ahmad Ehteshamul Islam, Muhammad A. Alam Purdue University, West Lafayette |
|---|---|
| Abstract | Mobility degradation due to generation of interface |
| Credits | Vrajesh D. Maheta Hitesh Das Souvik Mahapatra |
| Sponsored by | We acknowledge financial supports from Applied Materials, Renesas Technologies and Taiwan Semiconductor Manufacturing Company in this work. Thanks to Network for Computational Nanotechnology at Purdue University for providing the necessary computational facilities. |
| References | “Mobility Degradation Due to Interface Traps in Plasma Oxinitride PMOS Devices”, A. E. Islam, V. D. Maheta, H. Das, S. Mahapatra, and M. A. Alam, Proc. of International Reliability Physics Symposium, Apr 2008, pp. 87-96.[1] S. Villa, A. L. Lacaita, L. M. Perron, and R. Bez, "Physically based model of the effective mobility in heavily-doped n- MOSFET's," IEEE Trans. Electron Devices, vol. 45, pp. 110-115, 1998. [2] A. T. Krishnan, V. Reddy, S. Chakravarthi, J. Rodriguez, S. Natarajan, S. John, and S. Krishnan, "NBTI impact on Transistor and Circuit: Models, Mechanisms and Scaling Effects," IEDM Tech. Dig., pp. 349-352, 2003. [3] S. Mahapatra, K. Ahmed, D. Varghese, A. E. Islam, G. Gupta, L. Madhav, D. Saha, and M. A. Alam, "On the Physical Mechanism of NBTI in Silicon Oxynitride p-MOSFETs: Can Differences in Insulator Processing Conditions Resolve the Interface Trap Generation versus Hole Trapping Controversy?," Proc IEEE IRPS, pp. 1-9, 2007. |
| Cite this work | If you reference this work in a publication, please cite as follows: |
| Date posted | 01 Jul, 2008 |
| Type | Online Presentations |
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