Sending report ...Molecular Beam Epitaxy
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Usage Stats Last 12 Months: updated 01 Oct, 2008 Users: 8 Reviews & Citations Google/IEEE Avg. Review: Citations: 0
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| Contributor(s) | John C. Bean University of Virginia, Charlottesville, VA |
|---|---|
| Abstract |
Microelectronic devices are made by repeating two steps: 1) Depositing a thin uniform layer of material; 2) Then using a photographic process to pattern and remove unwanted areas of that layer. Layer thickness determines the height of the device, photography determines its length and width. So, to make devices smaller, you can make the layers thinner and/or make the photographic features finer. Molecular Beam Epitaxy (MBE) is the all time champ at making thin layers - with MBE one can routinely make layers a single atom thick! |
| Credits |
John Bean, University of Virginia |
| Cite this work | If you reference this work in a publication, please cite as follows: |
| Date posted | 16 Nov, 2005 |
| Type | Animations |
| Tags |
This resource describes Molecular Beam Epitaxy (MBE).Citations
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