Please be advised that the date of scheduled maintenance has been changed to Monday, June 17, 2024 beginning at approximately 8 am PDT/11 am EDT. Expect a minimum downtime of approximately 4 hours, barring any difficulties. All running tool sessions will expire during the maintenance window, please plan accordingly. We apologize for any inconvenience.
close
Powered by nanoHUB.org
Close

Liquid Dispersion Process Equipment Cleanup Controls

Operation

Post operation clean-up of liquid dispersion process equipment.

If dry nanoparticles were dispersed in the equipment, more conservative controls should be used as identified in the cleaning of dry powder process equipment.

Controls

  • Damp laboratory wipes shall be used to minimize particulate generation
  • Latex or nitrile clean room gloves
    • Contaminated gloves must be disposed of in the same closed receptacle.
  • If an exhausted enclosure is not available, PPE should be used to minimize potential for respiratory, dermal and eye exposure
  • Laboratory wipes shall be disposed of in closed receptacles that are in a ventilated enclosure

Alternatively, Control Banding may be employed when more is known about material reactivity, exposure duration and material state.

Material Specific Controls