Contributors: View
Ahmad Ehteshamul Islam

| Contributions | 2 (detailed usage) |
|---|---|
| Affiliation | Purdue University, West Lafayette |
| Web Site | http://web.ics.purdue.edu/~aeislam |
| Biography | Ahmad Ehteshamul Islam is a Direct PhD student of the Electrical and Computer Engineering Department at Purdue University. He started working with his present supervisor, Prof. M. Ashraful Alam on Fall 2005. His current research interest involves theory of oxide reliability in nanoscale devices, specifically on the physics of degradation in SiON, High-K and Strained-Si devices. He has also worked on modeling and characterization of MOS devices, while he was appointed in EE department of Bangladesh Univ. of Engg & Tech. as Lecturer. |
Contributions
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Device Reliability Tool
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Usage Stats Overall Period: Updated 21 Aug, 2008 Users: 187 Jobs: 760 Avg. exec. time: 57 secs Reviews & Citations Google/IEEE: updated 05 Feb, 2008 Avg. Review: Citations: 1
187 users, detailed statistics
28 Aug. 2006 | Tools | Contributor(s): Ahmad Ehteshamul Islam, Haldun Kufluoglu, Muhammad A. Alam
Analyzes MOS device reliability based on Negative Bias Temperature Instability (NBTI).
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Mobility Variation Due to Interface Trap Generation in Plasma Oxynitrided PMOS Devices
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Ranking is calculated from a formula comprised of user reviews and usage statistics. Learn more ›
Usage Stats Last 12 Months: updated 01 Aug, 2008 Users: 3 Reviews & Citations Google/IEEE Avg. Review: Citations: 0
3 users
01 Jul. 2008 | Online Presentations | Contributor(s): Ahmad Ehteshamul Islam, Muhammad A. Alam
Mobility degradation due to generation of interface traps, Δμeff(NIT), is a well-known phenomenon that has been theoretically interpreted by several mobility models. Based on these analysis, there is a general perception that Δμeff(NIT) is relatively insignificant (compared to Δμeff due to …