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Osamu Tabata was born in 1956. He received a M.S. degree and the Ph.D. degree from Nagoya Institute of Technology, Nagoya, Japan, in 1981 and in 1993, respectively. Since 1981, he had been with the Toyota Central Research and Development Laboratories, Inc., Aichi, Japan. In 1996, he joined the Department of Mechanical Engineering, Ritsumeikan University, Shiga, Japan. From September to December 2000, he was a guest Professor of Institute of Microsystem Technology, University of Freiburg, Germany and from January to March 2001, he was a guest Professor of ETH Zurich, Switzerland. In 2003, he joined the Department of Mechanical Engineering, Kyoto University, Kyoto, Japan. From April 2005 to now, he is a Professor at the Department of Micro Engineering, Kyoto University, Kyoto, Japan. He is currently engaged in the research of micro/nano process, MEMS and micro/nano system synthetic engineering. At the new position, he started the research to realize a unique and novel nanosystem by assembling the various functional components such as a microchip, a particle, a microcapsule, a cell, etc., with sizes ranging from the nanometer to micrometer scale on a few mm square MEMS substrate. This technology is termed SENS (synthetic engineering for nano systems), and experimental and theoretical research on the establishment of SENS is pursued.

He is an associate editor of Journal of Micro Electro Mechanical Systems and an editorial board member of Sensors and Actuators. Also, he is a program committee member of many International Conferences. He was honored with the Science News Award for research in "Monolithic pressure-flow sensor" in 1987, Presentation Paper Award for research in "Anisotropic etching of silicon in TMAH solutions" in 1992, R&D 100 Award for research in "Thin film Young's modulus measurement apparatus" in 1993 and R&D 100 Award for research in "Thin film Tensile Tester" in 1998, Best Poster Award of 19th Sensor Symposium on Sensors, Micromachines, and Applied Systems for "Determination of Optimal Mask Movement Pattern for Moving Mask Deep X-Ray Lithography" in 2002, Best Patent Award from Ritsumeikan University for "Material Processing and its apparatus using X-ray Lithography" in 2004. He is a member of the Japan Society of Mechanical Engineers, senior member of the Institute of Electrical Engineers of Japan and the Institute of Electrical and Electronics Engineers.