Online Simulation

And More

Top 25 Tags (all tags)

  1. algorithms
  2. carbon nanotubes
  3. circuits
  4. course lecture
  5. cyberinfrastructure
  6. devices
  7. education/outreach
  8. experiments
  9. material science
  10. molecular electronics
  11. nano/bio
  12. nanobio applications
  13. nano electro-mechanical systems
  14. nanoelectronics
  15. nanomedicine
  16. nanophotonics
  17. nano-transistors
  18. nanowires
  19. NEGF
  20. quantum dots
  21. research seminar
  22. SURI
  23. tutorial
  24. uIllinois
  25. uiuc

Other

Trouble Report

For immediate assistance browse through our support center. You can find answers to many questions in just a few minutes.

If still experiencing problems, send us a report.

Sending report ...

Contributors: View

Shuqing (Victor) Cao

Contributor picture

Contributions 4 (detailed usage)
Affiliation Stanford University
Biography Victor is a student in Engineer's program at Stanford University. His research interests include quantum effect in device, Technology CAD application and optimization, analog circuit design, silicon process technology and compact modeling for circuit design.

Contributions

  1. Process Lab: Concentration Dependent Diffusion

    This resource has a 9.0 Ranking

    Ranking is calculated from a formula comprised of user reviews and usage statistics. Learn more ›

    Usage Stats
    Overall Period: Updated 24 Jul, 2008
    Users: 372
    Jobs: 12990
    Avg. exec. time: 2 secs
    Reviews & Citations
    Google/IEEE
    Avg. Review: 0.0 out of 5 stars
    Citations: 0

    372 users, detailed statistics

    0 reviews (Review this)

    0 citations

    0 questions (Ask a question)

    31 Oct. 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin

    Simulates the dopant diffusion process in integrated circuit fabrication

  2. Process Lab: Oxidation

    This resource has a 9.6 Ranking

    Ranking is calculated from a formula comprised of user reviews and usage statistics. Learn more ›

    Usage Stats
    Overall Period: Updated 24 Jul, 2008
    Users: 427
    Jobs: 15540
    Avg. exec. time: 25 mins
    Reviews & Citations
    Google/IEEE
    Avg. Review: 5.0 out of 5 stars
    Citations: 0

    427 users, detailed statistics

    2 reviews (Review this)

    0 citations

    0 questions (Ask a question)

    19 Oct. 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin

    Simulates the oxidation process in integrated circuit fabrication

  3. Process Lab: Oxidation Flux

    This resource has a 5.9 Ranking

    Ranking is calculated from a formula comprised of user reviews and usage statistics. Learn more ›

    Usage Stats
    Overall Period: Updated 24 Jul, 2008
    Users: 234
    Jobs: 2206
    Avg. exec. time: 2 hours
    Reviews & Citations
    Google/IEEE
    Avg. Review: 0.0 out of 5 stars
    Citations: 0

    234 users, detailed statistics

    0 reviews (Review this)

    0 citations

    0 questions (Ask a question)

    19 Oct. 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin

    Simulates the oxidation flux in the oxide growth process in integrated circuit fabrication

  4. Process Lab: Point Defect Coupled Diffusion

    This resource has a 5.1 Ranking

    Ranking is calculated from a formula comprised of user reviews and usage statistics. Learn more ›

    Usage Stats
    Overall Period: Updated 24 Jul, 2008
    Users: 139
    Jobs: 1155
    Avg. exec. time: 2 secs
    Reviews & Citations
    Google/IEEE
    Avg. Review: 3.0 out of 5 stars
    Citations: 0

    139 users, detailed statistics

    1 review (Review this)

    0 citations

    0 questions (Ask a question)

    31 Oct. 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin

    Simulates the point-defect-coupled diffusion process in integrated circuit fabrication