Contributors: View
Peter Griffin

| Contributions | 4 (detailed usage) |
|---|---|
| Affiliation | Stanford University |
Contributions
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Process Lab: Concentration Dependent Diffusion
- This resource has a 9.5 Ranking
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Ranking is calculated from a formula comprised of user reviews and usage statistics. Learn more ›
Usage Stats Overall Period: Updated 07 Oct, 2008 Users: 378 Jobs: 13040 Avg. exec. time: 2 secs Reviews & Citations Google/IEEE Avg. Review: Citations: 0
378 users, detailed statistics
31 Oct. 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin
Simulates the dopant diffusion process in integrated circuit fabrication
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Process Lab: Oxidation
- This resource has a 9.9 Ranking
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Ranking is calculated from a formula comprised of user reviews and usage statistics. Learn more ›
Usage Stats Overall Period: Updated 07 Oct, 2008 Users: 440 Jobs: 15620 Avg. exec. time: 26 mins Reviews & Citations Google/IEEE Avg. Review: Citations: 0
440 users, detailed statistics
19 Oct. 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin
Simulates the oxidation process in integrated circuit fabrication
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Process Lab: Oxidation Flux
- This resource has a 6.5 Ranking
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Ranking is calculated from a formula comprised of user reviews and usage statistics. Learn more ›
Usage Stats Overall Period: Updated 07 Oct, 2008 Users: 235 Jobs: 2210 Avg. exec. time: 2 hours Reviews & Citations Google/IEEE Avg. Review: Citations: 0
235 users, detailed statistics
19 Oct. 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin
Simulates the oxidation flux in the oxide growth process in integrated circuit fabrication
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Process Lab: Point Defect Coupled Diffusion
- This resource has a 5.5 Ranking
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Ranking is calculated from a formula comprised of user reviews and usage statistics. Learn more ›
Usage Stats Overall Period: Updated 07 Oct, 2008 Users: 140 Jobs: 1159 Avg. exec. time: 2 secs Reviews & Citations Google/IEEE Avg. Review: Citations: 0
140 users, detailed statistics
31 Oct. 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin
Simulates the point-defect-coupled diffusion process in integrated circuit fabrication