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| Nanolithography | |
|---|---|
| Description: | Nano 501 Tutorial
Nanolithography Minghao Qi, School of Electrical and Computer Engineering, Purdue University Abstract: Integrated circuits have dramatically changed the way people live, communicate and work over the past forty years. For example, digital storage has almost eliminated the need for printed materials as a method of preserving information. However, another means of printing, or lithography, has been the driving force for the ever faster, cheaper, yet more powerful computer chips. Lithography is probably the most important process in transforming human creativity and engineering efforts into real devices or systems. This tutorial will go through pattern generation and duplication, as well as resist technology. Both fundamental laws governing the resolution and throughput of lithography and latest trends in state-of-the-art lithography will be discussed. At the nanometer length scale, lithography continues to play a central role in prototyping novel devices, and will meet in the near future the bottom-up approach, which generates patterns by controlled chemical growth/synthesis. |
| When: |
Wednesday, February 28 2007, 2:00pm - 3:00pm |
| Where: | Purdue University, EE 317 |
| Submitted by: Alicia Goodman | |